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On the operation of a Micropattern Gaseous UV-Photomultiplier in Liquid-Xenon

机译:微图案气相紫外光电倍增管的工作原理   液态氙气

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摘要

Operation results are presented of a UV-sensitive gaseous photomultiplier(GPM) coupled through a MgF2 window to a liquid-xenon scintillator. Itconsisted of a reflective CsI photocathode deposited on top of a THick GaseousElectron Multiplier (THGEM); further multiplication stages were either a secondTHGEM or a Parallel Ionization Multiplier (PIM) followed by a MICROMEsh GAseousStructure (MICROMEGAS). The GPM operated in gas-flow mode with non-condensablegas mixtures. Gains of 10^4 were measured with a CsI-coated double-THGEMdetector in Ne/CH4 (95:5), Ne/CF4 (95:5) and Ne/CH4/CF4 (90:5:5), with softX-rays at 173 K. Scintillation signals induced by alpha particles in liquidxenon were measured here for the first time with a double-THGEM GPM in He/CH4(92.5:7.5) and a triple-structure THGEM/PIM/MICROMEGAS GPM in Ne/CH4 (90:10)with a fast-current preamplifier.
机译:给出了通过MgF2窗口耦合到液氙闪烁体的紫外线敏感气体光电倍增器(GPM)的操作结果。它由沉积在厚气体电子倍增器(THGEM)顶部的反射式CsI光电阴极组成;进一步的乘法阶段是第二THGEM或并行电离乘法器(PIM),然后是MICROMEsh GAseousStructure(MICROMEGAS)。 GPM在气流模式下与不可冷凝的气体混合物一起运行。使用CsI涂层双THGEM检测器在ne / CH4(95:5),Ne / CF4(95:5)和Ne / CH4 / CF4(90:5:5)中使用softX-测量了10 ^ 4的增益在173 K处发出X射线。由He / CH4(92.5:7.5)中的双THGEM GPM和Ne / CH4中的三重结构THGEM / PIM / MICROMEGAS GPM在这里首次测量了由液氙中的α粒子引起的闪烁信号。 (90:10)与快速电流前置放大器。

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